Ultra-pure water system for a wafer-cleaning line
A semiconductor line required ultra-pure water with ppt-level metals and strict TOC/DO control, operating 24/7 without excursions.
Puraxtek installed a double-pass RO + EDI + polishing-loop UPW system with PFA piping, inline resistivity/TOC/DO/particle analytics and a high-recovery design.
Resistivity held at 18.2 MΩ·cm with TOC ≤ 5 ppb; water recovery raised to 88%, cutting make-up water cost.
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